Among our cleaning processes for plasma pre-treatment, plasma cleaners have undoubtedly become the mainstream in the current market. The core of the plasma cleaner is to clean and clean the surface of the object through plasma reaction. So what are the physical and chemical reactions that occur in the process of plasma cleaning the surface of the object? Then let Xiaobian Rogen take you to get to know it!
 

　　The reaction between plasma and solid surface can be divided into physical reaction and chemical reaction：
 

　　1. Physical reaction
 

　　The physical reaction mechanism is that the active particles bombard the surface to be cleaned, so that the contaminants are separated from the surface, and finally sucked away by the vacuum pump;
 

　　Plasma cleaning, which is centered on plasma reaction based on physical reaction, has the advantage that there is no chemical reaction on its own, and there is no oxide on the cleaned surface. The disadvantage of maintaining the chemical purity of the cleaned object is that it causes great damage to the surface and causes a lot of damage. Large thermal effect, poor selectivity to various substances on the surface to be cleaned, and low corrosion rate.
 

　　2. Chemical reaction
 

　　The chemical reaction mechanism is that various active particles react with pollutants to produce volatile substances, and then the volatile substances are sucked away by a vacuum pump.
 

　　The advantages of plasma cleaning centered on chemical reactions are high cleaning speed, good selectivity, and effective removal of organic pollutants. The disadvantage is that oxides are generated on the surface. Compared with physical reactions, the shortcomings of chemical reactions are difficult to overcome.
 

　　Moreover, the effects of the two reaction mechanisms on the surface microscopic morphology are obviously different. The physical reaction can make the surface rougher in the molecular level range and change the bonding characteristics of the surface.
 

　　Another type of plasma cleaning plays an important role in physical and chemical reactions in the surface reaction mechanism, that is, reactive ion corrosion or reactive ion beam corrosion. The two kinds of cleaning can promote each other. Ion bombardment can damage the surface to be cleaned, weaken its chemical bond or form an atomic state, and easily absorb the reactant. Ion collisions heat the object being cleaned, making it easier to react. The effect is good selectivity, cleaning rate, uniformity and directionality.

　　The common plasma physical cleaning process is argon plasma cleaning. Argon itself is an inert gas. The argon in the plasma does not react with the surface, but makes the surface clean by ion bombardment. The common plasma chemical cleaning process is oxygen plasma cleaning. Oxygen free radicals generated by plasma are very active and easily react with hydrocarbons to produce volatile substances such as carbon dioxide, carbon monoxide and water, thereby removing surface contaminants.

　　The above is to take you to understand the "physical reaction and chemical reaction between the plasma and the surface of the object". If it is helpful to you, please continue to pay attention to us!