Is plasma cleaning machine and plasma cleaning machine the same thing?

That's right, plasma cleaning machine is another name for plasma cleaning machine. Plasma cleaning machine is often called plasma cleaning machine in Taiwan. It is a dry, non-destructive ultra cleaning method, the fourth state of matter, composed of positively and negatively charged particles and neutral particles. By adding different working gases and exciting them under the action of electromagnetic fields, plasma is generated, which undergoes physical and chemical reactions with the surface of the object. It is connected to an external vacuum pump, and the plasma gently washes the surface of the object being cleaned during operation. 

The plasma plasma cleaning machine can thoroughly clean organic pollutants in a short period of time, and at the same time, the pollutants are pumped away by the vacuum pump of the plasma cleaning machine. The cleaning degree can reach the molecular level, and can be applied to substrate cleaning, soldering or welding processes in mixed circuit board manufacturing, gold plating parts cleaning, semiconductor cleaning, optical device cleaning before coating, etc., thereby achieving cleaning, activation, modification and other purposes.

Today, let's delve into the working principle of plasma cleaning machine together:

Firstly, plasma can only treat the surface of the object being cleaned and cannot clean the interior of the object. However, cleaning is not just about cleaning, but also involves physical and chemical reactions between the plasma and the surface of the object during the cleaning process. Working gas is introduced during the cleaning process, causing the plasma to react with the surface of the object. 

The principle of physical reaction is to use chemical (active) particles to impact and clean the surface, causing pollutants to move away from the surface. The chemical reaction principle of vacuum pump suction is that various chemical (active) particles react with pollutants to produce volatile substances. Vacuum pump suction of volatile substances achieves the purpose of cleaning.

secondly, H2、N2、 02. Xenon gas is a common working gas, and plasma plasma cleaning machines are used to process metals, semiconductors, and most polymer materials such as polypropylene, polyester, polyimide, polyethylene, cyclic argon, and polytetrafluoroethylene. This makes it easy for us to think that it can help many manufacturers solve long-standing problems by treating residues on the surface of materials that are invisible to the naked eye, while forming a new oxide layer film on the surface.

Finally, the surface cleaning function of plasma plasma, as plasma is generated by glow discharge of gas in a vacuum chamber, contains many "active" components, including high-energy electrons in high-speed motion, atoms and molecules in ionization and ionization states, neutral atoms, molecules and atomic groups in activated states, as well as unreacted atoms and molecules. These "active" components can remove organic residual impurities on the surface of materials, thoroughly clean the surface, and greatly improve the surface properties of materials. 

The high-energy "active" components in plasma strongly affect the surface of materials and undergo relatively complex physical changes, producing strong etching effects, removing some unstable bonding layers on the surface, increasing surface roughness and roughness, Beneficial for improving the overall stability of composite material surfaces.

In summary, plasma cleaning machines can improve the wetting performance of surfaces, form active surfaces, and remove organic matter and oil stains. Fine cleaning and electrostatic discharge can not only enhance surface adhesion but also improve the reliability and durability of surface bonding.