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What are the applicable fields of plasma etching technology?

source:本站author:超級管理員time:2025-04-10views:164878808

What is plasma cleaning etching and can it remove residual organic matter on the surface?


The low-temperature plasma cleaning machine removes organic pollutants by generating reactive plasma inside the chamber. Reactive gas plasma, commonly known as oxygen or ozone plasma, is generated inside the chamber. The low-temperature plasma cleaning machine can remove residual pollutants from the chamber, making the surface clean, accurate, and residue free.

Low temperature plasma cleaning machine is an environmentally friendly cleaning technology widely used in industries such as 3C electronics and biomedicine. Plasma cleaning equipment can effectively remove organic residues and is more environmentally friendly and cost-effective compared to wet cleaning.


Low temperature plasma surface etching is a plasma treatment method used to increase the surface area of materials at the microscale. The surface of the component is etched by a reactive process gas, and the material is etched from the surface, transformed into a gas phase, and removed by a vacuum system. The surface area is greatly increased, the surface energy is increased, and the material is easily wetted. Many materials, such as plastic products, are particularly suitable for low-temperature plasma surface etching treatment before printing, bonding, and painting, otherwise it will affect the surface adhesion,


Low temperature plasma etching can not only remove impurities and pollutants on the surface, but also modify the material surface to improve surface roughness, hydrophilicity, or other physical and chemical properties. For example, etching treatment on the surface of plastic can increase its surface roughness and improve the adhesion of coatings or printing.

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The atmospheric pressure plasma cleaning machine can precisely control the parameters of the plasma, such as power, gas flow rate, and processing time, to achieve precise control of etching depth and accuracy. This enables it to meet the requirements of different materials and processes, and has good adaptability to small-sized structures and high-precision etching tasks. Especially in semiconductor manufacturing, plasma cleaning technology enables precise etching of nanostructures with good uniformity. During the processing, plasma can be evenly distributed on the surface of the object being processed, achieving a more uniform etching effect. 


By ensuring the uniform distribution of plasma, relatively consistent etching depth and surface quality can be obtained. Plasma cleaning machines are suitable for various flat or complex shaped objects. This is crucial for large-scale production and ensuring consistency in product quality.


Low temperature plasma cleaning machine not only has cleaning function, but also has etching function. With its advantages of precise control, good uniformity, excellent surface modification effect, and minimal material damage, it has been widely used in multiple fields. Currently, the widely used fields include:


1. In semiconductor manufacturing, plasma etching can efficiently and accurately remove photoresist without damaging the circuit structure on the chip surface.

2. In the manufacturing of printed circuit boards (PCBs), the etching effect of plasma cleaning machines can be used to remove impurities such as oxides and organic matter on the surface of the PCB, improve the cleanliness and roughness of the PCB surface, enhance soldering performance and adhesion.

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3. In metal materials, plasma cleaning and etching can remove the surface oxide layer, improve the surface roughness, and enhance the adhesion of coatings and electroplating layers.


4. In the manufacturing of optical lenses, plasma cleaning and etching technology can be used to remove pollutants and organic residues on the surface of optical lenses, improving their transmittance and surface quality. At the same time, it can also be used for micro nano structure processing of lens surfaces to optimize optical properties such as anti reflection and anti reflection.


In summary, plasma cleaning equipment etching technology can be applied in many fields and plays a crucial role.


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